Material: ≥99.95% tungsten, WNiFe, WNiCu, WCu
Temper condition: R, m
Dimension: ≥0.1*(20-600)*(L≤1000)mm
Standard: ASTM B760-2007
Application: Semiconductor ion injection parts, electric vacuum parts and electric light source parts, refractory parts for industrial high temperature furnace, used as tungsten sputtering target material.