Tantalum sputtering target

• Material: R05200
• Purity: ≥99.95%, ≥99.99%
• Dimension: Customization
• Standard: ASTM B708-2012
• Application: Used for optical fiber, semiconductor wafer and integrated circuit of sputtering deposition coating. Used for glass, ceramic, LCD coating. Used for the cathode sputtering coating, high vacuum suction
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